We have compiled a list of manufacturers, distributors, product information, reference prices, and rankings for DLC film deposition equipment.
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DLC film deposition equipment Product List and Ranking from 5 Manufacturers, Suppliers and Companies

Last Updated： Aggregation Period:Sep 24, 2025～Oct 21, 2025
This ranking is based on the number of page views on our site.

DLC film deposition equipment Manufacturer, Suppliers and Company Rankings

Last Updated： Aggregation Period:Sep 24, 2025～Oct 21, 2025
This ranking is based on the number of page views on our site.

  1. Creative Coatings Co., Ltd. Tokyo//Electronic Components and Semiconductors
  2. 栗田製作所 本社・京都事業部 Kyoto//Industrial Electrical Equipment
  3. ヒューズテクノネット Tokyo//Electronic Components and Semiconductors
  4. 4 東製 Chiba//Industrial Machinery
  5. 5 null/null
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DLC film deposition equipment Product ranking

Last Updated： Aggregation Period:Sep 24, 2025～Oct 21, 2025
This ranking is based on the number of page views on our site.

  1. Low-temperature DLC film deposition device (multi-layer ta-C, hydrogen-free) Creative Coatings Co., Ltd.
  2. DLC film deposition device "Plasma Ion Injection Film Deposition Device" 栗田製作所 本社・京都事業部
  3. Huz Technonet DLC Coating Device ヒューズテクノネット
  4. 4 Container-specific DLC film deposition device
  5. 4 DLC (Diamond-Like Carbon) Film Deposition Device 東製

DLC film deposition equipment Product List

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DLC film deposition device "Plasma Ion Injection Film Deposition Device"

DLC film deposition device "Plasma Ion Injection Film Deposition Device"

3D, large-scale, low-temperature processing possible! Plasma ion implantation film deposition device using proprietary development technology.

The "Plasma Ion Injection Film Deposition Device" employs proprietary technology and is a DLC film deposition device capable of three-dimensional, large-scale, and low-temperature processing. It is a uniquely developed device by Kurita Seisakusho and has obtained a patent (Patent No. 3555928). By supplying the output of the pulse RF power source for plasma generation and the high-voltage pulse power source for ion injection from a single electrode, it enables plasma generation tailored to the substrate shape. DLC coating and gas ion injection processing can be performed with this single device. 【Features】 - Capable of three-dimensional shape film deposition - Can accommodate larger devices - Capable of low-temperature processing - Fully automated operation - Reliable log function For more details, please contact us or download the catalog.

  • Plasma surface treatment equipment

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Corrosion resistance measures using DLC <STD-DLC>

Corrosion resistance measures using DLC <STD-DLC>

We will deposit a DLC with excellent corrosion resistance and almost no pinholes using a thick film.

Our method allows for the deposition of DLC with low internal stress. As a result, thick DLC films can be deposited, which are resistant to most acids and alkalis. We can also deposit on complex shapes and the inner surfaces of pipes, which is difficult for other companies.

  • Surface treatment contract service

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Low-temperature DLC film deposition device (multi-layer ta-C, hydrogen-free)

Low-temperature DLC film deposition device (multi-layer ta-C, hydrogen-free)

It is now possible to achieve low-temperature DLC (Diamond-like carbon) thin film hard coatings with improved adhesion compared to conventional ta-C!

High-density and stable high-quality film formation is possible! By performing DLC film formation that is highly hard (wear-resistant), has a low friction coefficient (wear-resistant), is corrosion-resistant, adhesion-resistant, and smooth, we contribute to the longevity of mold parts for semiconductor manufacturing equipment, resin molding molds, sliding components, and tools. This is not only optimal for reducing customer costs but also for reducing maintenance work hours, such as cleaning tasks, and for business improvement. It is also possible to achieve "high adhesion, smooth & hard low-temperature DLC film formation" for three-dimensional ultra-precise complex-shaped molds and machine parts. In addition to improving hardness and wear resistance, we also accept "peeling treatment and re-coating," contributing to the reduction of product life cycle costs and material waste, thus reducing environmental impact. ++++++++++++++++++++++++++++++ DLC stands for Diamond-Like Carbon, which refers to a hard thin-film coating with good sliding properties that has intermediate characteristics between diamond and graphite. By adjusting the ratio of SP3 (diamond bonds) to SP2 (graphite bonds) and the ratio of H (hydrogen) contained within, as well as by applying multilayer coatings, it is possible to create thin films with various physical properties and characteristics (industrial value).

  • Plasma surface treatment equipment
  • Surface treatment contract service
  • Other semiconductor manufacturing equipment

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DLC (Diamond-Like Carbon) Film Deposition Device

DLC (Diamond-Like Carbon) Film Deposition Device

For medical applications and optical components! Plasma CVD equipment that can reduce initial and running costs.

The "Diamond-Like Carbon Film Deposition Device" is a thermal cathode PIG (Penning Ion Gauge Discharge Type) plasma CVD device. It enables processing at low temperatures and high vacuum, achieving the formation of DLC (Diamond-Like Carbon) films with excellent hardness and smoothness. Compared to other methods, it allows for independent control of the amount and energy of ions incident on the substrate, enabling extremely wide-ranging control of film quality. Additionally, Tosei Corporation also offers surface treatment processing that widely utilizes the excellent characteristics of diamond-like carbon films on materials such as cemented carbide, stainless steel, and tool steel. 【Features】 ■ Low friction coefficient ■ Wear resistance ■ Low aggressiveness ■ Non-welding ■ Insulating *For more details, please refer to the catalog or feel free to contact us.

  • Other contract services

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Huz Technonet DLC Coating Device

Huz Technonet DLC Coating Device

Technology accelerates within possibilities.

DCL refers to a carbon film that has properties similar to diamond. It possesses significant characteristics such as an extremely hard surface, and there are expectations for its use in industrial materials and processed products, as well as the birth of new materials.

  • Other semiconductor manufacturing equipment

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Low-temperature DLC film deposition device (multilayer a-C:H, hydrogen-containing Cr system)

Low-temperature DLC film deposition device (multilayer a-C:H, hydrogen-containing Cr system)

Multi-layer film formation enables the improvement of load-bearing capacity for low-temperature DLC (Diamond-like carbon) thin film hard coatings!

High-density and stable high-quality film formation is possible! By performing DLC film formation that is highly hard (wear-resistant), has a low friction coefficient (wear-resistant), is corrosion-resistant, adhesion-resistant, and smooth, we contribute to the longevity of mold parts for semiconductor manufacturing equipment, resin molding molds, sliding parts, and tools. This is not only optimal for reducing customer costs but also for reducing maintenance work hours such as cleaning tasks and improving operations. It is also possible to achieve "strong adhesion, smoothness, and hard low-temperature DLC film formation" for three-dimensional ultra-precise complex-shaped molds and machine parts. In addition to improving hardness and wear resistance, we also accept "peeling treatment and re-coating," contributing to the reduction of product lifecycle costs and material waste, thus reducing environmental impact. ++++++++++++++++++++++++++++++ DLC stands for Diamond-Like Carbon, which refers to a hard thin film coating with good sliding properties that has intermediate characteristics between diamond and graphite. By adjusting the ratio of SP3 (diamond bonds) to SP2 (graphite bonds) and the ratio of H (hydrogen) contained within, as well as by applying multilayer coatings, it is possible to create thin films with various physical properties and characteristics (industrial value).

  • Plasma surface treatment equipment
  • Surface treatment contract service
  • Other semiconductor manufacturing equipment

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Low-temperature DLC film deposition device (multilayer CrN/TiAIN, hydrogen-containing Ti-based)

Low-temperature DLC film deposition device (multilayer CrN/TiAIN, hydrogen-containing Ti-based)

Multi-layer film formation enables the creation of low-temperature DLC (Diamond-like carbon) thin film hard coatings with improved impact resistance!

High-density and stable high-quality film formation is possible! By performing DLC film formation that is highly hard (wear-resistant), has a low friction coefficient (wear-resistant), is corrosion-resistant, adhesion-resistant, and smooth, we contribute to the longevity of mold parts for semiconductor manufacturing equipment, resin molding molds, sliding parts, and tools. This is not only optimal for customer cost reduction but also for reducing maintenance work hours such as cleaning tasks and improving operations. It is also possible to achieve "strong adhesion, smooth & hard low-temperature DLC film formation" for three-dimensional ultra-precise complex-shaped molds and machine parts. In addition to improving high hardness and wear resistance, we also accept "peeling treatment and re-coating," contributing to the reduction of product lifecycle costs and material waste, thus reducing environmental impact. ++++++++++++++++++++++++++++++ DLC stands for Diamond-Like Carbon, which refers to a hard thin film coating with good sliding properties that possesses intermediate characteristics between diamond and graphite. By adjusting the ratio of SP3 (diamond bonds) to SP2 (graphite bonds) and the ratio of H (hydrogen) contained within, as well as by applying multilayer coatings, it is possible to create thin films with various physical properties and characteristics (industrial value).

  • Plasma surface treatment equipment
  • Surface treatment contract service
  • Other semiconductor manufacturing equipment

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